发明申请
WO2018142179A1 APPARATUS FOR APPLYING A DEPOSITION ONTO A SUBSTRATE BY A DEPOSITION PROCESS AND METHOD FOR CARRYING OUT A DEPOSITION PROCESS BY USE OF SUCH AN APPARATUS
审中-公开
基本信息:
- 专利标题： APPARATUS FOR APPLYING A DEPOSITION ONTO A SUBSTRATE BY A DEPOSITION PROCESS AND METHOD FOR CARRYING OUT A DEPOSITION PROCESS BY USE OF SUCH AN APPARATUS
- 申请号：PCT/IB2017/000931 申请日：2017-07-31
- 公开(公告)号：WO2018142179A1 公开(公告)日：2018-08-09
- 发明人： BRORS, Daniel
- 申请人： C4E TECHNOLOGY GMBH
- 申请人地址： Callenberger Strasse 52 96450 Coburg DE
- 专利权人： C4E TECHNOLOGY GMBH
- 当前专利权人： C4E TECHNOLOGY GMBH
- 当前专利权人地址： Callenberger Strasse 52 96450 Coburg DE
- 代理机构： GOSDIN, Michael
- 优先权： US62/453,818 20170202
- 主分类号： C23C16/44
- IPC分类号： C23C16/44 ; C23C16/50 ; H01J37/32
摘要：
The invention relates to an apparatus (1) for applying a deposition onto a substrate (2) by a deposition process, wherein the apparatus (1) comprises a first vacuum chamber (3) which can be evacuated by means of a first evacuation pump (4). To improve the deposition process the invention is characterized in that a second vacuum chamber (5) for receiving the substrate (2) is arranged within the first vacuum chamber (3). Furthermore, the invention relates to a method for carrying out a deposition process for applying a deposition onto a substrate by use of such an apparatus.