发明申请
WO2017085727A1 METHOD AND A SYSTEM FOR DETERMINING RADIATION SOURCES CHARACTERISTICS IN A SCENE BASED ON SHADOWING ANALYSIS
审中-公开
基本信息:
- 专利标题： METHOD AND A SYSTEM FOR DETERMINING RADIATION SOURCES CHARACTERISTICS IN A SCENE BASED ON SHADOWING ANALYSIS
- 专利标题（中）：基于影子分析确定场景中辐射源特征的方法和系统
- 申请号：PCT/IL2016/051243 申请日：2016-11-20
- 公开(公告)号：WO2017085727A1 公开(公告)日：2017-05-26
- 发明人： PROTTER, Matan , KUSHNIR, Motti , GOLDBERG, Felix
- 申请人： INFINITY AUGMENTED REALITY ISRAEL LTD.
- 申请人地址： 7 Mota Gur Street PO Box 10230 4900202 Petach-Tikva IL
- 专利权人： INFINITY AUGMENTED REALITY ISRAEL LTD.
- 当前专利权人： INFINITY AUGMENTED REALITY ISRAEL LTD.
- 当前专利权人地址： 7 Mota Gur Street PO Box 10230 4900202 Petach-Tikva IL
- 代理机构： WEILER, Assaf et al.
- 优先权： US14/947,584 20151120
- 主分类号： G06T7/507
- IPC分类号： G06T7/507 ; G06T7/73 ; G01B11/24 ; G03B15/02
摘要：
A method and a system for analyzing distinct light or radiation sources affecting a scene are provided. The method may include: sensing at least one image of a scene containing surfaces and objects, wherein the scene is illuminated by at least one distinct radiation or source; maintaining a database of the scene which stores approximate positions of at least some of the objects in the scene; identifying at least one candidate silhouette suspected to be cast by the at least one distinct light or radiation source, deriving properties of the at least one distinct light or radiation source, based on the at least one identified silhouette, based on data derived from the database.
摘要（中）：
提供了用于分析影响场景的不同光源或辐射源的方法和系统。 该方法可以包括：感测包含表面和物体的场景的至少一个图像，其中场景由至少一个不同的辐射或源照亮; 维护场景的数据库，其存储场景中至少一些对象的近似位置; 识别怀疑由所述至少一个不同的光或辐射源投射的至少一个候选剪影，基于从所述数据库导出的数据，基于所述至少一个识别的剪影，导出所述至少一个不同的光或辐射源的性质