发明申请
WO2012086850A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION
审中-公开
基本信息:
- 专利标题： ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION
- 专利标题（中）：抗紫外线或辐射敏感性树脂组合物，其抗紫外线或辐射敏感性膜及其使用组合物形成图案的方法
- 申请号：PCT/JP2011/080559 申请日：2011-12-22
- 公开(公告)号：WO2012086850A1 公开(公告)日：2012-06-28
- 发明人： MATSUDA, Tomoki , SHIBUYA, Akinori , TOKUGAWA, Yoko , YAMAGUCHI, Shuhei , FUJITA, Mitsuhiro
- 申请人： FUJIFILM Corporation , MATSUDA, Tomoki , SHIBUYA, Akinori , TOKUGAWA, Yoko , YAMAGUCHI, Shuhei , FUJITA, Mitsuhiro
- 申请人地址： 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620 JP
- 专利权人： FUJIFILM Corporation,MATSUDA, Tomoki,SHIBUYA, Akinori,TOKUGAWA, Yoko,YAMAGUCHI, Shuhei,FUJITA, Mitsuhiro
- 当前专利权人： FUJIFILM Corporation,MATSUDA, Tomoki,SHIBUYA, Akinori,TOKUGAWA, Yoko,YAMAGUCHI, Shuhei,FUJITA, Mitsuhiro
- 当前专利权人地址： 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620 JP
- 代理机构： KURATA, Masatoshi et al.
- 优先权： JP2010-288726 20101224; JP2011-187711 20110830
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/039 ; H01L21/027
摘要：
Provided are an actinic-ray- or radiation-sensitive resin composition that excels in the sensitivity, roughness characteristics and exposure latitude, and a method of forming a pattern using the same. The composition includes (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and (B) a compound that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, the compound being any of compounds of general formula (1-1) below.
摘要（中）：
提供了在灵敏度，粗糙度特性和曝光宽容度上优异的光化射线或辐射敏感性树脂组合物，以及使用其形成图案的方法。 该组合物包含（A）当被酸作用时分解的树脂，从而增加其在碱性显影剂中的溶解度，和（B）当暴露于光化射线或辐射时被分解从而产生酸的化合物 该化合物是下述通式（1-1）的化合物中的任何一种。