基本信息:
- 专利标题： MONOCRYSTALLINE EPITAXIALLY ALIGNED NANOSTRUCTURES AND RELATED METHODS
- 专利标题（中）：单结构外延对齐的纳米结构和相关方法
- 申请号：PCT/US2011027172 申请日：2011-03-04
- 公开(公告)号：WO2011109702A2 公开(公告)日：2011-09-09
- 发明人： WIESNER ULRICH , THOMPSON MICHAEL , ARORA HITESH
- 申请人： UNIV CORNELL , WIESNER ULRICH , THOMPSON MICHAEL , ARORA HITESH
- 专利权人： UNIV CORNELL,WIESNER ULRICH,THOMPSON MICHAEL,ARORA HITESH
- 当前专利权人： UNIV CORNELL,WIESNER ULRICH,THOMPSON MICHAEL,ARORA HITESH
- 优先权： US31109810 2010-03-05
摘要：
A method for fabricating a nanostructure utilizes a templated monocrystalline substrate. The templated monocrystalline substrate is energetically (i.e., preferably thermally) treated, with an optional precleaning and an optional amorphous material layer located thereupon, to form a template structured monocrystalline substrate that includes the monocrystalline substrate with a plurality of epitaxially aligned contiguous monocrystalline pillars extending therefrom. The monocrystalline substrate and the plurality of epitaxially aligned contiguous monocrystalline pillars may comprise the same or different monocrystalline materials. The method provides the nanostructure where when the monocrystalline substrate and the plurality of epitaxial aligned contiguous monocrystalline pillars comprise different monocrystalline materials having a bulk crystal structure mismatch of up to about 10 percent, lattice mismatch induced crystal structure defects may be avoided interposed between the monocrystalline substrate and the plurality of epitaxially aligned contiguous monocrystalline pillars, which may have an irregular sidewall shape.
摘要（中）：
制造纳米结构的方法使用模板化单晶衬底。 模板化的单晶衬底在能量上（即，优选热处理），具有可选的预清洗和位于其上的任选的非晶材料层，以形成模板结构的单晶衬底，其包括具有从其延伸的多个外延比对的邻接单晶柱的单晶衬底 。 单晶衬底和多个外延排列的邻接单晶柱可以包括相同或不同的单晶材料。 该方法提供纳米结构，其中当单晶衬底和多个外延对准的邻接单晶柱包含具有高达约10％的体晶结构失配的不同单晶材料时，晶格失配诱发的晶体结构缺陷可以避免插入在单晶衬底 以及可能具有不规则侧壁形状的多个外延排列的邻接单晶柱。