基本信息:
- 专利标题： METHOD FOR REDUCING THIN FILMS ON LOW TEMPERATURE SUBSTRATES
- 专利标题（中）：在低温基底上减薄薄膜的方法
- 申请号：PCT/US2009/038289 申请日：2009-03-25
- 公开(公告)号：WO2010044904A1 公开(公告)日：2010-04-22
- 发明人： POPE, Dave, S. , SCHRODER, Kurt, A. , RAWSON, Ian, M.
- 申请人： NCC NANO, LLC , POPE, Dave, S. , SCHRODER, Kurt, A. , RAWSON, Ian, M.
- 申请人地址： Three Forest Plaza, Suite 930 12221 Merit Drive Dallas, TX 75250 US
- 专利权人： NCC NANO, LLC,POPE, Dave, S.,SCHRODER, Kurt, A.,RAWSON, Ian, M.
- 当前专利权人： NCC NANO, LLC,POPE, Dave, S.,SCHRODER, Kurt, A.,RAWSON, Ian, M.
- 当前专利权人地址： Three Forest Plaza, Suite 930 12221 Merit Drive Dallas, TX 75250 US
- 代理机构： NG, Antony, P.
- 优先权： US61/196,531 20081017
- 主分类号： C23C18/00
- IPC分类号： C23C18/00
摘要：
A method for producing an electrically conductive thin film on a substrate is disclosed. Initially, a reducible metal compound and a reducing agent are dispersed in a liquid. The dispersion is then deposited on a substrate as a thin film. The thin film along with the substrate is subsequently exposed to a pulsed electromagnetic emission to chemically react with the reducible metal compound and the reducing agent such that the thin film becomes electrically conductive.
摘要（中）：
公开了一种在基板上制造导电薄膜的方法。 最初，还原性金属化合物和还原剂分散在液体中。 然后将分散体作为薄膜沉积在基材上。 随后将薄膜与衬底一起暴露于脉冲电磁发射以与可还原金属化合物和还原剂发生化学反应，使得薄膜变得导电。