基本信息:
- 专利标题: APPARATUS AND METHOD FOR FEEDING A PROCESS MEDIUM
- 专利标题(中):用于送入工艺介质的装置和方法
- 申请号:PCT/EP2009057285 申请日:2009-06-12
- 公开(公告)号:WO2009153219A2 公开(公告)日:2009-12-23
- 发明人: TIKOVSKY ANDREAS
- 申请人: AIR LIQUIDE , INTEGA GMBH , TIKOVSKY ANDREAS
- 专利权人: AIR LIQUIDE,INTEGA GMBH,TIKOVSKY ANDREAS
- 当前专利权人: AIR LIQUIDE,INTEGA GMBH,TIKOVSKY ANDREAS
- 优先权: DE102008029008 2008-06-20
- 主分类号: G05D16/16
- IPC分类号: G05D16/16
摘要:
The apparatus (1) according to the invention for regulating a process medium flow (2) to be fed to a process medium consumer (28), comprising a) a process medium path (3), by means of which a process medium source (27) can be connected to the process medium consumer (28), and b) a control gas path (4), by means of which a control gas pressure can be built up with a control gas, wherein the process medium path (3) comprises a pneumatic pressure regulator (5), the control input (6) of which is connected to the control gas path (4), wherein means (7) for regulating the control gas pressure are embodied, is distinguished by the fact that the means (7) for regulating the control gas pressure comprise a delivery valve (8) for connecting the control gas path (4) to a control gas pressure source (9) and a discharge valve (10) for decreasing pressure in the control gas path (4). The apparatus (1) according to the invention and the method according to the invention advantageously permit precise regulation of the process medium flow (2) from a process medium source (27) to a process medium consumer (28) using simple means. On account of the magnetic valves (8, 10, 19) used such as, for example, the magnetic 5/3-way directional valve (19) for increasing or decreasing a control gas pressure in a control gas path (4), corresponding regulation can even be used in areas at risk of an explosion, such as, for example, in ultra-clean rooms, in implanters (18) or the like.
摘要(中):
根据本发明的用于调节要供给到处理介质消耗器(28)的处理介质流(2)的装置(1),包括:a)处理介质路径(3),借助于该处理介质路径 27)可以连接到处理介质消耗器(28),以及b)控制气体通道(4),通过该控制气体通道可以与控制气体一起建立控制气体压力,其中处理介质路径(3) 包括气动压力调节器(5),其控制输入(6)连接到控制气体通路(4),其中体现了用于调节控制气体压力的装置(7),其特征在于装置 用于调节控制气体压力的控制气体压力(7)包括用于将控制气体路径(4)连接到控制气体压力源(9)的排出阀(8)和用于减小控制气体通路中的压力的排出阀(10) 4)。 根据本发明的装置(1)和根据本发明的方法有利地允许使用简单的方法将处理介质流(2)从处理介质源(27)精确调节到处理介质消耗器(28)。 由于例如用于增加或减少控制气体路径(4)中的控制气体压力的磁性5/3方向阀(19)所使用的电磁阀(8,10,19),对应于 甚至可以在具有爆炸危险的区域(例如超洁净室,植入器(18)等)中使用。