基本信息:
- 专利标题： TETRAHYDROPYRANOCHROMENE GAMMA SECRETASE INHIBITORS
- 申请号：PCT/US2008/008192 申请日：2008-07-01
- 公开(公告)号：WO2009008980A3 公开(公告)日：2009-01-15
- 发明人： WU, Wen-lian , BARA, Thomas, A. , BURNETT, Duane, A. , CLADER, John, W. , DOMALSKI, Martin S. , JIN, Yan , JOSIEN, Hubert, B. , LI, Hongmei , LIANG, Xian , PISSARNITSKI, Dmitri, A. , SASIKUMAR, Thavalakulamgara, K. , WONG, Jesse, K. , XU, Ruo , ZHAO, Zhiqiang , MCNAMARA, Paul
- 申请人： SCHERING CORPORATION , WU, Wen-lian , BARA, Thomas, A. , BURNETT, Duane, A. , CLADER, John, W. , DOMALSKI, Martin S. , JIN, Yan , JOSIEN, Hubert, B. , LI, Hongmei , LIANG, Xian , PISSARNITSKI, Dmitri, A. , SASIKUMAR, Thavalakulamgara, K. , WONG, Jesse, K. , XU, Ruo , ZHAO, Zhiqiang , MCNAMARA, Paul
- 申请人地址： 2000 Galloping Hill Road Kenilworth, New Jersey 07033 US
- 专利权人： SCHERING CORPORATION,WU, Wen-lian,BARA, Thomas, A.,BURNETT, Duane, A.,CLADER, John, W.,DOMALSKI, Martin S.,JIN, Yan,JOSIEN, Hubert, B.,LI, Hongmei,LIANG, Xian,PISSARNITSKI, Dmitri, A.,SASIKUMAR, Thavalakulamgara, K.,WONG, Jesse, K.,XU, Ruo,ZHAO, Zhiqiang,MCNAMARA, Paul
- 当前专利权人： SCHERING CORPORATION,WU, Wen-lian,BARA, Thomas, A.,BURNETT, Duane, A.,CLADER, John, W.,DOMALSKI, Martin S.,JIN, Yan,JOSIEN, Hubert, B.,LI, Hongmei,LIANG, Xian,PISSARNITSKI, Dmitri, A.,SASIKUMAR, Thavalakulamgara, K.,WONG, Jesse, K.,XU, Ruo,ZHAO, Zhiqiang,MCNAMARA, Paul
- 当前专利权人地址： 2000 Galloping Hill Road Kenilworth, New Jersey 07033 US
- 代理机构： JEANETTE, Henry, C.
- 优先权： US60/948,033 20070705
- 主分类号： C07D311/78
- IPC分类号： C07D311/78 ; C07D407/12 ; C07D493/04 ; A61K31/35 ; A61K31/352 ; A61P25/28
摘要：
Disclosed are novel gamma secretase inhibitors of the formula. Also disclosed are methods of inhibiting gamma-secretase, methods of treating neurodegenerative diseases, and methods of treating Alzheimer's Disease. Also disclosed are processes for preparing alkenes in one reaction step using a mixture of an aldehyde (or ketone) and an alkyl substituted with two electron withdrawing groups, and reacting the mixture with: (a) a sulfonyl halide (e.g., a sulfonyl chloride) and a basic tertiary amine, or, (b) a sulfonyl anhydride and a basic amine, or (c) an aryl-C(O)-halide and a basic tertiary amine, or (d) an aryl-C(O)-O-C(O)-aryl and a basic tertiary amine, or (e) an heteroaryl-C(O)-halide and a basic tertiary amine, or (f) a heteroaryl-C(O)-O-C(O)-heteroaryl and a basic tertiary amine.
IPC结构图谱:
| C | 化学；冶金 |
| --C07 | 有机化学 |
| ----C07D | 杂环化合物 |
| ------C07D311/00 | 杂环化合物，含六元环，有1个氧原子作为仅有的杂环原子，与其他环稠合 |
| --------C07D311/02 | .与碳环或碳环系邻位或迫位稠合 |
| ----------C07D311/78 | ..有3个或更多个相关环的环系 |