基本信息:
- 专利标题： METHODS OF PATTERNING A DEPOSIT METAL ON A POLYMERIC SUBSTRATE
- 专利标题（中）：在聚合物基体上沉积金属的方法
- 申请号：PCT/US2007081027 申请日：2007-10-11
- 公开(公告)号：WO2008048840A3 公开(公告)日：2008-06-12
- 发明人： FREY MATTHEW H , NGUYEN KHANH P
- 申请人： 3M INNOVATIVE PROPERTIES CO
- 专利权人： 3M INNOVATIVE PROPERTIES CO
- 当前专利权人： 3M INNOVATIVE PROPERTIES CO
- 优先权： US55062606 2006-10-18
- 主分类号： C23C18/16
- IPC分类号： C23C18/16 ; C23C18/31
摘要：
A method of patterning a deposit metal on a polymeric substrate is described. The method includes providing a polymeric film substrate having a major surface with a relief pattern having a recessed region and an adjacent raised region, depositing a first material onto the major surface of the polymeric film substrate to form a coated polymeric film substrate, forming a layer of a functionalizing material selectively onto the raised region of the coated polymeric film substrate to form a functionalized raised region and an unfunctionalized recessed region, and depositing electrolessly a deposit metal selectively on the unfunctionalized recessed region.
摘要（中）：
描述了在聚合物基底上图案化沉积金属的方法。 该方法包括提供具有主表面的聚合物膜基底，具有凹陷区域和相邻凸起区域的浮雕图案，将第一材料沉积到聚合物膜基材的主表面上以形成涂覆的聚合物膜基材，形成层 的官能化材料选择性地涂覆到涂覆的聚合物膜基材的凸起区域上以形成官能化的凸起区域和未功能化的凹陷区域，并且将沉积金属选择性地沉积在未功能化的凹陷区域上。