发明申请
WO2006060359A2 HIGH POWER HIGH PULSE REPETITION RATE GAS DISCHARGE LASER SYSTEM BANDWIDTH MANAGEMENT
审中-公开
基本信息:
- 专利标题: HIGH POWER HIGH PULSE REPETITION RATE GAS DISCHARGE LASER SYSTEM BANDWIDTH MANAGEMENT
- 专利标题(中):高功率高脉冲重复率气体放电激光系统带宽管理
- 申请号:PCT/US2005/043055 申请日:2005-11-28
- 公开(公告)号:WO2006060359A2 公开(公告)日:2006-06-08
- 发明人: SANDSTROM, Richard, L. , PARTLO, William, N. , BROWN, Daniel, J., W. , ALGOTS, J., Martin , TRINTCHOUK, Fedor
- 申请人: CYMER, INC. , SANDSTROM, Richard, L. , PARTLO, William, N. , BROWN, Daniel, J., W. , ALGOTS, J., Martin , TRINTCHOUK, Fedor
- 申请人地址: 17075 Thornmint Court, San Diego, California 92127-2413 US
- 专利权人: CYMER, INC.,SANDSTROM, Richard, L.,PARTLO, William, N.,BROWN, Daniel, J., W.,ALGOTS, J., Martin,TRINTCHOUK, Fedor
- 当前专利权人: CYMER, INC.,SANDSTROM, Richard, L.,PARTLO, William, N.,BROWN, Daniel, J., W.,ALGOTS, J., Martin,TRINTCHOUK, Fedor
- 当前专利权人地址: 17075 Thornmint Court, San Diego, California 92127-2413 US
- 代理机构: CRAY, William, C.
- 优先权: US11/000,571 20041130
- 主分类号: H01S3/22
- IPC分类号: H01S3/22
摘要:
A line narrowing apparatus and method for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses is disclosed, which may comprise a dispersive center wavelength selection optic contained within a line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive wavelength selection optic dispersive surface; a first dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a first manner; and, a second dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a second manner. The first manner may modify a first measure of bandwidth and the second manner may modify a second measure of bandwidth such that the ratio of the first measure to the second measure substantially changes. The first measure may be a spectrum width at a selected percentage of the spectrum peak value (FWX%M) and the second measure may be width within which some selected percentage of the spectral intensity is contained (EX%). The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second in a second dimension generally orthogonal to the first dimension. The laser system may comprise a beam path insert comprising a material having an different index of refraction and an index of refraction thermal gradient opposite from that of a neighboring optical element. The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second a second dimension generally parallel to the first dimension. An optical beam twisting element in the lasing cavity may optically twist the laser light pulse beam to present a twisted wavefront to the dispersive center wavelength selection optic. Bending may change the curvature and wavelength selection, e.g., in a burst may create two center wavelength peaks to select FWX%M and EX% independently.
摘要(中):
公开了一种用于窄带DUV大功率高重复率气体放电激光器的脉冲串产生输出激光脉冲束脉冲的线窄化装置和方法,其可包括包含在线窄模块内的分散中心波长选择光学器件,选择 用于每个脉冲的至少一个中心波长至少部分地由在分散波长选择光学色散表面上包含各个脉冲的激光束的入射角确定; 第一分散光学弯曲机构,其可操作地连接到所述分散中心波长选择光学器件并且可操作以以第一方式改变所述分散表面的曲率; 以及第二分散光学弯曲机构,其可操作地连接到所述分散中心波长选择光学器件并且以第二方式改变所述分散表面的曲率。 第一种方式可以修改第一带宽测量,第二种方式可以修改第二带宽度量,使得第一测量与第二测量的比率基本上改变。 第一测量可以是频谱峰值(FWX%M)的选定百分比处的频谱宽度,第二测量可以是包含频谱强度的某些选定百分比(EX%)的宽度。 第一分散光学弯曲机构可以在第一维度上改变分散表面的曲率,而第二维度可以大致正交于第一维度。 激光系统可以包括光束路径插入件,其包括具有不同折射率的材料和与相邻光学元件的折射率相反的折射热梯度。 第一分散光学弯曲机构可以改变分散表面在第一维度中的曲率,而第二分辨率曲线机构可以改变大体平行于第一尺寸的第二尺寸。 激光腔中的光束加捻元件可以光学地扭转激光脉冲光束,以将扭曲的波前呈现到色散中心波长选择光学器件。 弯曲可以改变曲率和波长选择,例如,在脉冲串中可以产生两个中心波长峰值,以独立地选择FWX%M和EX%。