发明申请
WO2005101466A2 METHODS FOR FABRICATING ISOLATED MICRO- AND NANO- STRUCTURES USING SOFT OR IMPRINT LITHOGRAPHY
审中-公开
基本信息:
- 专利标题： METHODS FOR FABRICATING ISOLATED MICRO- AND NANO- STRUCTURES USING SOFT OR IMPRINT LITHOGRAPHY
- 专利标题（中）：使用软件或印刷图形制作分离的微结构和纳米结构的方法
- 申请号：PCT/US2004/042706 申请日：2004-12-20
- 公开(公告)号：WO2005101466A2 公开(公告)日：2005-10-27
- 发明人： DESIMONE, Joseph, M. , ROLLAND, Jason, P. , EXNER, Ansley, E. , SAMULSKI, Edward, T. , SAMULSKI, R., Jude , MAYNOR, Benjamin, W. , EULISS, Larken, E. , DENISON, Ginger, M.
- 申请人： THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL , NORTH CAROLINA STATE UNIVERSITY , DESIMONE, Joseph, M. , ROLLAND, Jason, P. , EXNER, Ansley, E. , SAMULSKI, Edward, T. , SAMULSKI, R., Jude , MAYNOR, Benjamin, W. , EULISS, Larken, E. , DENISON, Ginger, M.
- 申请人地址： 308 Bynum Hall, Campus Box 4105, Chapel Hill, NC 27599-4105 US
- 专利权人： THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL,NORTH CAROLINA STATE UNIVERSITY,DESIMONE, Joseph, M.,ROLLAND, Jason, P.,EXNER, Ansley, E.,SAMULSKI, Edward, T.,SAMULSKI, R., Jude,MAYNOR, Benjamin, W.,EULISS, Larken, E.,DENISON, Ginger, M.
- 当前专利权人： THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL,NORTH CAROLINA STATE UNIVERSITY,DESIMONE, Joseph, M.,ROLLAND, Jason, P.,EXNER, Ansley, E.,SAMULSKI, Edward, T.,SAMULSKI, R., Jude,MAYNOR, Benjamin, W.,EULISS, Larken, E.,DENISON, Ginger, M.
- 当前专利权人地址： 308 Bynum Hall, Campus Box 4105, Chapel Hill, NC 27599-4105 US
- 代理机构： TAYLOR, Arles, A., Jr.
- 优先权： US60/531,531 200301219; US60/583,170 20040625; US60/604,970 20040827
- 主分类号： H01L21/02
- IPC分类号： H01L21/02
摘要：
The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography techniques.
摘要（中）：
目前公开的主题描述了基于氟化弹性体的材料，特别是基于全氟聚醚（PFPE）的材料在高分辨率软或压印光刻应用中的应用，例如微米和纳米级复制成型，以及第一纳米接触 使用弹性体模具成型有机材料以产生高保真特征。 因此，本文公开的主题描述了使用软或压印光刻技术来生产任何形状的独立，分离的纳米结构的方法。
IPC结构图谱:
| H | 电学 |
| --H01 | 基本电气元件 |
| ----H01L | 半导体器件；其他类目未包含的电固体器件 |
| ------H01L21/00 | 专门适用于制造或处理半导体或固体器件或其部件的方法或设备 |
| --------H01L21/02 | .半导体器件或其部件的制造或处理 |