基本信息:
- 专利标题： SELECTIVE DEPOSITION OF MATERIALS ON CONTOURED SURFACES
- 申请号：PCT/US2002/009149 申请日：2002-03-25
- 公开(公告)号：WO2002086452A3 公开(公告)日：2002-10-31
- 发明人： OSTUNI, Emanuele , CHEN, Christopher, S. , INGBER, Donald, E. , WHITESIDES, George, M.
- 申请人： PRESIDENT AND FELLOWS OF HARVARD COLLEGE , CHILDREN'S MEDICAL CENTER CORPORATION , OSTUNI, Emanuele , CHEN, Christopher, S. , INGBER, Donald, E. , WHITESIDES, George, M.
- 申请人地址： Holyoke Center-Suite 727, 1350 Massachussetts Avenue, Cambridge, MA 02138 US
- 专利权人： PRESIDENT AND FELLOWS OF HARVARD COLLEGE,CHILDREN'S MEDICAL CENTER CORPORATION,OSTUNI, Emanuele,CHEN, Christopher, S.,INGBER, Donald, E.,WHITESIDES, George, M.
- 当前专利权人： PRESIDENT AND FELLOWS OF HARVARD COLLEGE,CHILDREN'S MEDICAL CENTER CORPORATION,OSTUNI, Emanuele,CHEN, Christopher, S.,INGBER, Donald, E.,WHITESIDES, George, M.
- 当前专利权人地址： Holyoke Center-Suite 727, 1350 Massachussetts Avenue, Cambridge, MA 02138 US
- 代理机构： OYER, Timothy, J.
- 优先权： US60/278,092 20010323
- 主分类号： C12N11/08
- IPC分类号： C12N11/08
摘要：
A material is selectively deposited on substrate having a contoured surface including protrusions and recesses. A first fluid is applied to the surface to contact the protrusions and not the recesses, and a first material is deposited on the substrate where the substrate is in contact with the fluid. A second fluid may be applied to contact the recesses, and a second material is deposited on the substrate where the substrate is in contact with the fluid. A third fluid may be applied, and a third material having affinity for one of the first and second materials is deposited only where one of the first and second materials is deposited. The first and second material may be a protein, and the first, second and third materials may respectively be cytophobic, cytophilic and a cell. The substrate may be formed of a polymer such as polydimethylsiloxane. A cell containment device is provided containing the substrate with a cytophobic material connected to the protrusions and a cytophilic material connected to the recesses.
公开/授权文献:
- WO2002086452A2 SELECTIVE DEPOSITION OF MATERIALS ON CONTOURED SURFACES 公开/授权日：2002-10-31