发明申请
WO01075946A1 MULTIBEAM EXPOSURE APPARATUS COMPRISING MULTIAXIS ELECTRON LENS, MULTIAXIS ELECTRON LENS FOR FOCUSING MULTIPLE ELECTRON BEAM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
审中-公开
基本信息:
- 专利标题： MULTIBEAM EXPOSURE APPARATUS COMPRISING MULTIAXIS ELECTRON LENS, MULTIAXIS ELECTRON LENS FOR FOCUSING MULTIPLE ELECTRON BEAM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- 专利标题（英）：Multibeam exposure apparatus comprising multiaxis electron lens, multiaxis electron lens for focusing multiple electron beam, and method for manufacturing semiconductor device
- 专利标题（中）：包含多片电子透镜的多孔曝光装置，用于聚焦多个电子束的多光子电子透镜以及用于制造半导体器件的方法
- 申请号：PCT/JP2001/002280 申请日：2001-03-22
- 公开(公告)号：WO01075946A1 公开(公告)日：2001-10-11
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H01J37/317 ; H01L21/027 ; H01J37/065 ; H01J37/141 ; H01J37/305
摘要：
An electron beam exposure apparatus characterized by comprising a multiaxis electron lens which has a lens portion magnetic conductive part provided with apertures and arranged generally parallel and a nonmagnetic conductive part disposed between the lens portion magnetic conductive parts and provided with through holes and in which the apertures and through holes form lens apertures through which beams pass.
摘要（中）：
一种电子束曝光装置，其特征在于包括多透镜电子透镜，该透镜部分磁导体部分设置有大致平行的孔，并且设置在透镜部分磁性导电部分之间并设置有通孔的非磁性导电部分， 并且通孔形成光束通过的透镜孔。