基本信息:
- 专利标题： Stage system and lithographic apparatus comprising such stage system
- 申请号：US14423405 申请日：2013-08-19
- 公开(公告)号：US09785060B2 公开(公告)日：2017-10-10
- 发明人： Ruud Antonius Catharina Maria Beerens , Rob Johan Theodoor Rutten , Jan Steven Christiaan Westerlaken , Koen Jacobus Johannes Maria Zaal , Richard Henricus Adrianus Van Lieshout , Engelbertus Antonius Fransiscus Van Der Pasch
- 申请人： ASML Netherlands B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pilsbury Winthrop Shaw Pittman LLP
- 国际申请： PCT/EP2013/067253 WO 20130819
- 国际公布： WO2014/044477 WO 20140327
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G01D5/38 ; G01D5/34
摘要：
A stage system includes a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.