
基本信息:
- 专利标题: SEMICONDUCTOR STRUCTURE
- 申请号:US18357433 申请日:2023-07-24
- 公开(公告)号:US20240170607A1 公开(公告)日:2024-05-23
- 发明人: Weihua LIU , Liangfang SUN
- 申请人: ENKRIS SEMICONDUCTOR, INC.
- 申请人地址: CN Suzhou
- 专利权人: ENKRIS SEMICONDUCTOR, INC.
- 当前专利权人: ENKRIS SEMICONDUCTOR, INC.
- 当前专利权人地址: CN Suzhou
- 优先权: CN 2211477432.2 2022.11.23
- 主分类号: H01L33/06
- IPC分类号: H01L33/06 ; H01L33/26
摘要:
A semiconductor structure includes: a first semiconductor layer, a multiple quantum well layers formed on the first semiconductor layer, where the multiple quantum well layer includes a plurality of quantum barrier layers and a plurality of quantum well layers alternately arranged; an insertion layer formed on each of the plurality of quantum well layers; and a second semiconductor layer formed on the multiple quantum well layer; where a material of the insertion layer is a nitride containing a scandium component. In this application, the insertion layer, made of the nitride containing the scandium component, may repair deterioration problem of epitaxial quantum well materials. Moreover, a compressive stress on the quantum well layer located below is introduced, to achieve longer light-emitting wavelengths by using InGaN quantum well materials with a lower content of In component.