A low-profile cranial device is adapted for covering and protecting electrical leads. The cranial device includes a static cranial implant shaped and dimensioned for housing a functional neurosurgical implant including electrical leads. The static cranial implant includes an outer first surface along an exterior side of the static cranial implant, an inner second surface along an interior side of the static cranial implant, and a peripheral wall extending between the outer first surface and the inner second surface. A cavity is formed along the outer first surface of the static cranial implant, the cavity being shaped and dimensioned to house the functional neurosurgical implant in a manner allowing the electrical leads to be wound up to store excess electrical lead length.