基本信息:
- 专利标题： YTTRIUM ALUMINUM COATING FOR PLASMA PROCESSING CHAMBER COMPONENTS
- 申请号：US17792109 申请日：2021-01-21
- 公开(公告)号：US20230088848A1 公开(公告)日：2023-03-23
- 发明人： Lin XU , David Joseph WETZEL , Satish SRINIVASAN , Robin KOSHY , John Michael KERNS , John DAUGHERTY
- 申请人： Lam Research Corporation
- 申请人地址： US CA Fremont
- 专利权人： Lam Research Corporation
- 当前专利权人： Lam Research Corporation
- 当前专利权人地址： US CA Fremont
- 国际申请： PCT/US2021/014419 WO 20210121
- 主分类号： C23C24/08
- IPC分类号： C23C24/08 ; C23C4/11 ; C23C4/08 ; C04B41/50
摘要：
A component of a plasma processing chamber having a coating on at least one surface that comprises yttrium aluminum. The coating is an aerosol deposited coating from a powder mixture of an yttrium oxide powder and an aluminum-containing powder and having an yttrium to aluminum ratio of 4:1 to 1:4 by molar number. The coating can be annealed to form a porous ternary oxide.