基本信息:
- 专利标题： CROSS-TALK CANCELLATION IN MULTIPLE CHARGED-PARTICLE BEAM INSPECTION
- 申请号：US17633176 申请日：2020-08-20
- 公开(公告)号：US20220301811A1 公开(公告)日：2022-09-22
- 发明人： Wei FANG , Lingling PU , Bo WANG , Zhonghua DONG , Yongxin WANG
- 申请人： ASML Netherlands B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 国际申请： PCT/EP2020/072332 WO 20200820
- 主分类号： H01J37/22
- IPC分类号： H01J37/22 ; H01J37/244 ; H01J37/28 ; G01N23/2251 ; G06T5/00 ; G06T5/50
摘要：
An improved apparatus and method for enhancing an image, and more particularly an apparatus and method for enhancing an image through cross-talk cancellation in a multiple charged-particle beam inspection are disclosed. An improved method for enhancing an image includes acquiring a first image signal of a plurality of image signals from a detector of a multi-beam inspection system. The first image signal corresponds to a detected signal from a first region of the detector on which electrons of a first secondary electron beam and of a second secondary electron beam are incident. The method includes reducing, from the first image signal, cross-talk contamination originating from the second secondary electron beam using a relationship between the first image signal and beam intensities associated with the first secondary electron beam and the second secondary electron beam. The method further includes generating a first image corresponding to first secondary electron beam after reduction.