基本信息:
- 专利标题： APPARATUS FOR AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- 申请号：US17356998 申请日：2021-06-24
- 公开(公告)号：US20220157566A1 公开(公告)日：2022-05-19
- 发明人： Jiye KIM , In Cheol SONG , Woongpil JEON , Daihong KIM , Jaebeom PARK , Byungho CHUN
- 申请人： SAMSUNG ELECTRONICS CO., LTD.
- 申请人地址： KR Suwon-si
- 专利权人： SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人： SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址： KR Suwon-si
- 优先权： KR10-2020-0155349 20201119
- 主分类号： H01J37/32
- IPC分类号： H01J37/32 ; H05K9/00 ; C23C16/505
摘要：
An apparatus for manufacturing a semiconductor device includes a chamber including a lower housing and an upper housing, heater chucks in the lower housing, shower heads on the heater chucks, the shower heads being between the lower housing and the upper housing, power supplies connected to the shower heads to provide radio-frequency powers to the shower heads, power straps in the upper housing to connect the shower heads to the power supplies, and shielding members in the upper housing, the shielding members enclosing the power straps and the shower heads, respectively, the shielding members to prevent electromagnetic interference of the radio-frequency powers between the power straps and between the shower heads.