发明申请
US20220115214A1 LAMINATED AEROSOL DEPOSITION COATING FOR ALUMINUM COMPONENTS FOR PLASMA PROCESSING CHAMBERS
有权
基本信息:
- 专利标题： LAMINATED AEROSOL DEPOSITION COATING FOR ALUMINUM COMPONENTS FOR PLASMA PROCESSING CHAMBERS
- 申请号：US17432003 申请日：2020-03-03
- 公开(公告)号：US20220115214A1 公开(公告)日：2022-04-14
- 发明人： Lin XU , John DAUGHERTY , Satish SRINIVASAN , David Joseph WETZEL
- 申请人： Lam Research Corporation
- 申请人地址： US CA Fremont
- 专利权人： Lam Research Corporation
- 当前专利权人： Lam Research Corporation
- 当前专利权人地址： US CA Fremont
- 国际申请： PCT/US2020/020757 WO 20200303
- 主分类号： H01J37/32
- IPC分类号： H01J37/32 ; C23C28/04
摘要：
An apparatus adapted for use in a plasma processing chamber is provided. An aluminum body with at least one surface is provided. An aluminum oxide containing aerosol deposition coating is disposed over the at least one surface of the aluminum body. An yttrium containing aerosol deposition coating is disposed over the aluminum oxide containing aerosol deposition coating.