基本信息:
- 专利标题： ULTRA-HARD CARBON FILM FROM EPITAXIAL TWO-LAYER GRAPHENE
- 申请号：US16757306 申请日：2018-10-22
- 公开(公告)号：US20210404091A1 公开(公告)日：2021-12-30
- 发明人： Yang GAO , Tengfei CAO , Filippo CELLINI , Elisa RIEDO , Angelo BONGIORNO
- 申请人： RESEARCH FOUNDATION OF THE CITY UNIVERSITY OF NEW YORK , NEW YORK UNIVERSITY
- 申请人地址： US NY New York; US NY New York
- 专利权人： RESEARCH FOUNDATION OF THE CITY UNIVERSITY OF NEW YORK,NEW YORK UNIVERSITY
- 当前专利权人： RESEARCH FOUNDATION OF THE CITY UNIVERSITY OF NEW YORK,NEW YORK UNIVERSITY
- 当前专利权人地址： US NY New York; US NY New York
- 国际申请： PCT/US2018/056896 WO 20181022
- 主分类号： C30B33/00
- IPC分类号： C30B33/00 ; C01B32/194 ; C30B23/02 ; C30B29/02 ; A41D31/24 ; A42B3/04 ; F41H5/04
摘要：
An ultra-hard carbon film is formed by the uniaxial compression of thin films of graphene. The graphene films are two or three layers thick (2-L or 3-L). High pressure compression forms a diamond-like film and provides improved properties to the coated substrates.
公开/授权文献:
- US11591716B2 Ultra-hard carbon film from epitaxial two-layer graphene 公开/授权日：2023-02-28