发明申请
US20210364927A1 TARGET SUPPLY DEVICE, TARGET SUPPLY METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD
有权
基本信息:
- 专利标题： TARGET SUPPLY DEVICE, TARGET SUPPLY METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD
- 申请号：US17228000 申请日：2021-04-12
- 公开(公告)号：US20210364927A1 公开(公告)日：2021-11-25
- 发明人： Tsukasa HORI , Yutaka SHIRAISHI , Toshihiro NISHISAKA , Hiroshi SOMEYA , Yukio WATANABE
- 申请人： Gigaphoton Inc.
- 申请人地址： JP Tochigi
- 专利权人： Gigaphoton Inc.
- 当前专利权人： Gigaphoton Inc.
- 当前专利权人地址： JP Tochigi
- 优先权： JP2020-088560 20200521
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H05G2/00
摘要：
A target supply device may include a first container configured to contain a target substance, a second container configured to contain the target substance supplied from the first container, a first valve disposed between the first container and the second container, a first pipe connected to the second container and configured to supply pressurized gas to the second container, a third container configured to contain the target substance supplied from the second container, a second valve disposed between the second container and the third container, a second pipe connected to the third container and configured to supply pressurized gas to the third container, and a nozzle configured to output the target substance supplied from the third container.