基本信息:
- 专利标题： CLEANING SYSTEM AND METHOD FOR OPERATING THE CLEANING SYSTEM
- 申请号：US16691754 申请日：2019-11-22
- 公开(公告)号：US20200086362A1 公开(公告)日：2020-03-19
- 发明人： Nejc Lukac , Matjaz Lukac , Matija Jezersek , Peter Gregorcic
- 申请人： FOTONA D.O.O.
- 申请人地址： SI Ljubljana
- 专利权人： FOTONA D.O.O.
- 当前专利权人： FOTONA D.O.O.
- 当前专利权人地址： SI Ljubljana
- 优先权： EP15002308.3 20150803
- 主分类号： B08B7/02
- IPC分类号： B08B7/02 ; A61C17/02 ; A61C1/00 ; A61C5/40 ; A61B18/26 ; A61L2/00 ; B08B3/10
摘要：
The application relates to a cleaning system configured for cleaning of cavities filled with a liquid, including fragmentation, debridement, material removal, irrigation, disinfection, and decontamination. The cleaning system includes an electromagnetic radiation system and a liquid. A treatment handpiece irradiates the liquid within a cavity with a radiation beam, producing a first vapor bubble using first pulse, and, at a different location, a second vapor bubble using a second pulse. The pulse repetition time is adjusted to ensure efficacy, for example such that an onset time of the second vapor bubble is within the first contraction phase of the first vapor bubble, when the first vapor bubble has contracted from its maximal volume to a size in a range from about 0.7 to about 0.1 of the maximal volume.
公开/授权文献:
IPC结构图谱:
| B | 作业；运输 |
| --B08 | 清洁 |
| ----B08B | 一般清洁；一般污垢的防除 |
| ------B08B7/00 | 不包含在其他小类或本小类的其他组中的清洁方法 |
| --------B08B7/02 | .弯曲、拍打或振动被清洁的表面 |