基本信息:
- 专利标题： LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- 申请号：US16245400 申请日：2019-01-11
- 公开(公告)号：US20190250518A1 公开(公告)日：2019-08-15
- 发明人： Joeri LOF , Hans BUTLER , Sjoerd Nicolaas Lambertus DONDERS , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MEIJER , Johannes Catherinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Frank VAN SCHAIK , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Erik Theodorus Maria BIJLAART , Christiaan Alexander HOOGENDAM , Helmar VAN SANTEN , Marcus Adrianus VAN DE KERKHOF , Mark KROON , Arie Jeffrey DEN BOEF , Joost Jeroen OTTENS , Jeroen Johannes Sophia Maria MERTENS
- 申请人： ASML NETHERLANDS B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 优先权： EP03253636.9 20030609; EP03255395.0 20030829; EP03257068.1 20031110
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
公开/授权文献:
- US10678139B2 Lithographic apparatus and device manufacturing method 公开/授权日：2020-06-09