基本信息:
- 专利标题： LITHOGRAPHIC PROJECTION OBJECTIVE
- 申请号：US16048549 申请日：2018-07-30
- 公开(公告)号：US20190025709A1 公开(公告)日：2019-01-24
- 发明人： Olaf Rogalsky , Boris Bittner , Thomas Petasch , Jochen Haeussler
- 申请人： Carl Zeiss SMT GmbH
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
Projection objectives, such as projection objectives of lithography projection exposure apparatuses, as well as related systems, components and methods, such as methods of revising and/or repairing such objectives, are disclosed.