发明申请
US20180319740A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, AND COMPOUND
审中-公开
基本信息:
- 专利标题： RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, AND COMPOUND
- 申请号：US16032244 申请日：2018-07-11
- 公开(公告)号：US20180319740A1 公开(公告)日：2018-11-08
- 发明人： Natsuko KINOSHITA , Katsuaki NISHIKORI , Kouta FURUICHI
- 申请人： JSR CORPORATION
- 申请人地址： JP Tokyo
- 专利权人： JSR CORPORATION
- 当前专利权人： JSR CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2016-004837 20160113
- 主分类号： C07C309/69
- IPC分类号： C07C309/69 ; C07D295/084 ; C07D295/15 ; G03F7/038 ; G03F7/039 ; G03F7/20
摘要：
A radiation-sensitive resin composition includes a first polymer including a first structural unit that includes a first acid-labile group; a radiation-sensitive acid generator; and a compound represented by formula (1). n is 1 or 2. R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms in a case in which n is 1. R1 represents a divalent organic group having 1 to 20 carbon atoms in a case in which n is 2. R2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. E represents a group represented by formula (i). R2 and E may taken together represent a ring structure having 3 to 20 ring atoms together with the nitrogen atom. X represents a divalent organic group having 1 to 20 carbon atoms. R3 represents a second acid-labile group.
IPC结构图谱:
| C | 化学；冶金 |
| --C07 | 有机化学 |
| ----C07C | 无环或碳环化合物 |
| ------C07C309/00 | 磺酸；其卤化物、酯或酐 |
| --------C07C309/01 | .磺酸 |
| ----------C07C309/64 | ..酯化磺基的硫原子连接非环碳原子 |
| ------------C07C309/69 | ...碳架被不属于硝基或亚硝基的氮原子取代的 |