发明申请
US20180243094A1 Features for Implants with a Reduced Volumetric Density of Surface Roughness
审中-公开
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基本信息:
- 专利标题: Features for Implants with a Reduced Volumetric Density of Surface Roughness
- 申请号:US15903667 申请日:2018-02-23
- 公开(公告)号:US20180243094A1 公开(公告)日:2018-08-30
- 发明人: Christopher L. Jones , Ian Helmar , Lucas Diehl , Jason Tinley , Kevin D. Chappuis , John F. Sullivan
- 申请人: HD LifeSciences LLC
- 主分类号: A61F2/28
- IPC分类号: A61F2/28 ; A61F2/00 ; B22F3/105
摘要:
The invention disclosed herein includes implant features that can be used, in some embodiments, on devices with a volumetric density of less than about 100 percent and devices with a surface roughness of some value. The implant features include one or more protrusions mounted on the forward edge of an implant that can ease the distraction of tissue during implantation and reduce the occurrence of damage during a manufacturing process. In some embodiments, the protrusions have gaps in a non-axial direction with respect to the implant to allow axial compression with respect to the protrusions. In some embodiments, the protrusions have a circumferential gap between them and a body of a device to reduce any impact on the device's elastic modulus.