
基本信息:
- 专利标题: POLYIMIDE RESIN AND FILM USING SAME
- 申请号:US15569825 申请日:2015-04-28
- 公开(公告)号:US20180134848A1 公开(公告)日:2018-05-17
- 发明人: Chul Ha JU , Hak Gee JUNG , Hyo Jun PARK
- 申请人: KOLON INDUSTRIES, INC.
- 申请人地址: KR Gwacheon-si, Gyeonggi-do
- 专利权人: KOLON INDUSTRIES, INC.
- 当前专利权人: KOLON INDUSTRIES, INC.
- 当前专利权人地址: KR Gwacheon-si, Gyeonggi-do
- 国际申请: PCT/KR2015/004203 WO 20150428
- 主分类号: C08G73/10
- IPC分类号: C08G73/10 ; C08J5/18 ; B29C41/00 ; B29C41/46 ; B29C71/02
摘要:
This invention relates to a polyimide resin and a film using the same, wherein the polyimide resin is an imidized product of polyamic acid in which a polymerization composition including a diamine-based monomer and a dianhydride-based monomer is copolymerized, at least one of the diamine-based monomer and the dianhydride-based monomer including a monomer containing at least one selected from among an oxy group, a sulfone group and a fluoro group, the diamine-based monomer including at least one selected from among 1,3-bis(4-aminophenoxy)benzene and 2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane, and thus the polyimide resin has improved heat resistance and mechanical properties while being colorless and transparent and can thus be efficiently applied to a variety of fields, including semiconductor insulation layers, TFT-LCD insulation layers, passivation layers, liquid crystal alignment layers, optical communication materials, protective layers for solar cells, and flexible display substrates.