
基本信息:
- 专利标题: WELDED STATE MONITORING SYSTEM AND WELDED STATE MONITORING METHOD
- 专利标题(中):焊接状态监测系统和焊接状态监测方法
- 申请号:US15116543 申请日:2015-03-27
- 公开(公告)号:US20160350902A1 公开(公告)日:2016-12-01
- 发明人: Noboru HASEGAWA , Hideki HAMATANI , Yoshifumi KARUBE , Manabu UEDA , Michitoshi TANIMOTO , Takashi OOSAWA
- 申请人: NIPPON STEEL & SUMITOMO METAL CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: NIPPON STEEL & SUMITOMO METAL CORPORATION
- 当前专利权人: NIPPON STEEL & SUMITOMO METAL CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2014-077184 20140403
- 国际申请: PCT/JP2015/059662 WO 20150327
- 主分类号: G06T7/00
- IPC分类号: G06T7/00 ; B23K11/00 ; G02B5/20 ; B23K31/12 ; H04N5/247 ; G01N21/88 ; B21C37/08
摘要:
A welded state monitoring system according to an aspect of the present invention is a welded state monitoring system used for plasma shielded electric resistance welding in which electric resistance welding is performed while irradiating a weld zone of a steel sheet with plasma, and is provided with a plasma irradiation device which irradiates the weld zone with plasma, a first image capturing device which captures an image of the weld zone from above and has an image sensor capable of detecting light having a wavelength of 850 nm or more, a first wavelength region limiting device which limits light incident on the first image capturing device to a wavelength region of 850 nm or more, and an image processing device which subjects the image captured by the first image capturing device to image processing and analyzes the welded state of the weld zone thereby being able to analyze the welded state without being affected by the plasma.
摘要(中):
根据本发明的一个方面的焊接状态监测系统是用于等离子体屏蔽电阻焊接的焊接状态监测系统,其中在等离子体照射钢板的焊接区域的同时执行电阻焊接,并且设置有 等离子体照射焊接区域的等离子体照射装置,从上方捕获焊接区域的图像并具有能够检测波长为850nm以上的光的图像传感器的第一图像捕获装置,第一波长区域限制装置 其将入射在第一图像拍摄装置上的光限制在850nm以上的波长区域;以及图像处理装置,其对由第一图像拍摄装置拍摄的图像进行图像处理,并分析焊接区域的焊接状态,从而成为 能够分析焊接状态而不受等离子体的影响。
公开/授权文献:
IPC结构图谱:
G | 物理 |
--G06 | 计算;推算;计数 |
----G06T | 一般的图像数据处理或产生 |
------G06T7/00 | 图像分析,例如从位像到非位像 |