![Method of Forming a Solder Bump on a Substrate](/abs-image/US/2016/11/03/US20160322319A1/abs.jpg.150x150.jpg)
基本信息:
- 专利标题: Method of Forming a Solder Bump on a Substrate
- 专利标题(中):在基体上形成焊料凸块的方法
- 申请号:US14700420 申请日:2015-04-30
- 公开(公告)号:US20160322319A1 公开(公告)日:2016-11-03
- 发明人: Toyohiro Aoki , Hiroyuki Mori , Yasumitsu K. Orii , Kazushige Toriyama , Shintaro Yamamichi
- 申请人: International Business Machines Corporation
- 主分类号: H01L23/00
- IPC分类号: H01L23/00
摘要:
A method of forming a solder bump on a substrate includes: forming a conductive layer(s) on the substrate having a surface on which an electrode pad is prepared; forming a resist layer on the conductive layer(s) having an opening over the electrode pad; forming a metal pillar in the opening of the resist layer, wherein the metal pillar includes a first conductive material; forming a space between sidewalls of the resist layer and the metal pillar; forming a metal barrier layer in the space and on a top surface of the metal pillar, the metal barrier layer including a second conductive material that is different from the first conductive material of the metal pillar; forming a solder layer on the metal barrier layer over the top surface of the metal pillar; removing the resist layer; removing the conductive layer(s); and forming the solder bump by reflowing the solder layer.
摘要(中):
在基板上形成焊料凸块的方法包括:在基板上形成导电层,所述导电层具有制备电极焊盘的表面; 在所述电极焊盘上具有开口的所述导电层上形成抗蚀剂层; 在抗蚀剂层的开口中形成金属柱,其中金属柱包括第一导电材料; 在抗蚀剂层的侧壁和金属柱之间形成空间; 在金属柱的空间和顶表面上形成金属阻挡层,金属阻挡层包括与金属柱的第一导电材料不同的第二导电材料; 在所述金属阻挡层上在所述金属柱的顶表面上形成焊料层; 去除抗蚀剂层; 去除导电层; 以及通过回流焊料层形成焊料凸块。
公开/授权文献:
- US09520375B2 Method of forming a solder bump on a substrate 公开/授权日:2016-12-13
IPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01L | 半导体器件;其他类目未包含的电固体器件 |
------H01L23/00 | 半导体或其他固态器件的零部件 |