基本信息:
- 专利标题： INSPECTION APPARATUS
- 专利标题（中）：检查装置
- 申请号：US13997496 申请日：2011-11-02
- 公开(公告)号：US20130286191A1 公开(公告)日：2013-10-31
- 发明人： Masaaki Ito , Hidetoshi Nishimura , Takahiro Jingu
- 申请人： Masaaki Ito , Hidetoshi Nishimura , Takahiro Jingu
- 申请人地址： JP Tokyo
- 专利权人： HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人： HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2010-289105 20101227
- 国际申请： PCT/JP2011/006129 WO 20111102
- 主分类号： H04N7/18
- IPC分类号： H04N7/18
摘要：
In a defect inspecting apparatus, the strength of a fatal defect signal decreases due to miniaturization. Thus, in order to assure a high SN ratio, it is necessary to reduce noises caused by scattered light from a wafer. Roughness of a pattern edge and surface roughness which serve as a scattered-light source are spread over the entire wafer. The present invention has discovered the fact that reduction of an illuminated area is a technique effective for decreasing noises. That is to say, the present invention has discovered the fact that creation of an illuminated area having a spot shape and reduction of the dimension of a spot beam are effective. A plurality of temporally and spatially divided spot beams are radiated to the wafer serving as a sample.
摘要（中）：
在缺陷检查装置中，致命缺陷信号的强度由于小型化而降低。 因此，为了确保高的SN比，需要减少由晶片散射的光产生的噪声。 用作散射光源的图案边缘和表面粗糙度的粗糙度分布在整个晶片上。 本发明已经发现，减少照明区域是有效降低噪声的技术。 也就是说，本发明已经发现了具有斑点形状的照明区域的创建和点光束的尺寸的减小的事实是有效的。 将多个时间上和空间上分开的光束照射到作为样品的晶片。