发明申请
US20130048843A1 MULTI-BEAM EXPOSURE SCANNING METHOD AND APPARATUS AND PRINTING PLATE MANUFACTURING METHOD
审中-公开
![MULTI-BEAM EXPOSURE SCANNING METHOD AND APPARATUS AND PRINTING PLATE MANUFACTURING METHOD](/abs-image/US/2013/02/28/US20130048843A1/abs.jpg.150x150.jpg)
基本信息:
- 专利标题: MULTI-BEAM EXPOSURE SCANNING METHOD AND APPARATUS AND PRINTING PLATE MANUFACTURING METHOD
- 专利标题(中):多光束曝光扫描方法及装置及印版制作方法
- 申请号:US13594508 申请日:2012-08-24
- 公开(公告)号:US20130048843A1 公开(公告)日:2013-02-28
- 发明人: Ichirou MIYAGAWA , Norimasa Shigeta
- 申请人: Ichirou MIYAGAWA , Norimasa Shigeta
- 优先权: JP2011-185121 20110826
- 主分类号: H01J5/16
- IPC分类号: H01J5/16 ; B41C3/08
摘要:
A multi-beam exposure scanning method includes: simultaneously emitting a plurality of beams with an interval between scanning lines toward a recording medium; and performing engraving on a surface of the recording medium by performing exposure scanning a plurality of times with a same scanning line, the method further includes: repeatedly performing interlaced exposure using a beam group with an interval between adjacent beams N times (N is an integer equal to 2 or more) larger than the interval between the scanning lines N×m times (m is an integer equal to 2 or more) on a first area surrounding a flat-shaped target area to be left on the surface, to expose each of the scanning lines m times; and performing non-interlaced exposure using a beam group with an interval between adjacent beams equal to the interval between the scanning lines on a second area, which is outside the first area.
摘要(中):
多光束曝光扫描方法包括:以扫描线之间的间隔朝向记录介质同时发射多个光束; 并且通过以相同的扫描线多次进行曝光扫描,在记录介质的表面上进行雕刻,该方法还包括:使用相邻光束间隔N次的光束组重复进行隔行曝光(N为整数 等于2或更大)大于扫描线之间的间隔N×m次(m是等于2或更大的整数)在围绕要留在表面上的平面形目标区域的第一区域上,以使每个 的扫描线m次; 以及使用相邻光束之间的间隔等于在第一区域之外的第二区域上的扫描线之间的间隔的波束组来执行非隔行扫描。
IPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01J | 放电管或放电灯 |
------H01J5/00 | 通用于两种或两种以上基本类型的放电管或放电灯的外壳或引入线的零部件 |
--------H01J5/02 | .管壳;容器;与其相关的屏蔽;真空锁 |
----------H01J5/16 | ..与管壳结构相结合的光学或摄影装置 |