发明申请
US20100072537A1 BAND ENGINEERED NANO-CRYSTAL NON-VOLATILE MEMORY DEVICE UTILIZING ENHANCED GATE INJECTION
有权
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基本信息:
- 专利标题: BAND ENGINEERED NANO-CRYSTAL NON-VOLATILE MEMORY DEVICE UTILIZING ENHANCED GATE INJECTION
- 专利标题(中):使用增强门注射的带工程纳米晶体非易失性存储器件
- 申请号:US12623895 申请日:2009-11-23
- 公开(公告)号:US20100072537A1 公开(公告)日:2010-03-25
- 发明人: Arup Bhattacharyya
- 申请人: Arup Bhattacharyya
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 主分类号: H01L29/792
- IPC分类号: H01L29/792
摘要:
Non-volatile memory devices and arrays are described that utilize reverse mode non-volatile memory cells that have band engineered gate-stacks and nano-crystal charge trapping in EEPROM and block erasable memory devices, such as Flash memory devices. Embodiments of the present invention allow a reverse mode gate-insulator stack memory cell that utilizes the control gate for programming and erasure through a band engineered crested tunnel barrier. Charge retention is enhanced by utilization of high work function nano-crystals in a non-conductive trapping layer and a high K dielectric charge blocking layer. The band-gap engineered gate-stack with symmetric or asymmetric crested barrier tunnel layers of the non-volatile memory cells of embodiments of the present invention allow for low voltage tunneling programming and erase with electrons and holes, while maintaining high charge blocking barriers and deep carrier trapping sites for good charge retention.
摘要(中):
描述了使用具有带工程化栅极堆叠的反向模式非易失性存储器单元和在EEPROM和块可擦除存储器件(例如闪存器件)中的纳米晶体电荷俘获的非易失性存储器件和阵列。 本发明的实施例允许使用控制门的反向模式栅极 - 绝缘体堆叠存储器单元来编程和擦除通过波段设计的波峰隧道势垒。 通过在非导电捕获层和高K介电电荷阻挡层中利用高功函数纳米晶体来提高电荷保持率。 具有本发明实施例的非易失性存储单元的具有对称或非对称顶点势垒隧道层的带隙工程的栅极叠层允许用电子和空穴进行低电压隧道编程和擦除,同时保持高电荷阻挡屏障和深度 载体捕获位点,保持良好的电荷。
公开/授权文献:
IPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01L | 半导体器件;其他类目未包含的电固体器件 |
------H01L29/00 | 专门适用于整流、放大、振荡或切换,并具有至少一个电位跃变势垒或表面势垒的半导体器件;具有至少一个电位跃变势垒或表面势垒,例如PN结耗尽层或载流子集结层的电容器或电阻器;半导体本体或其电极的零部件 |
--------H01L29/02 | .按其半导体本体的特征区分的 |
----------H01L29/68 | ..只能通过对一个不通有待整流、放大或切换的电流的电极供给电流或施加电位方可进行控制的 |
------------H01L29/70 | ...双极器件 |
--------------H01L29/762 | ....电荷转移器件 |
----------------H01L29/78 | .....由绝缘栅产生场效应的 |
------------------H01L29/792 | ......带有电荷捕获栅绝缘体,例如MNOS存储晶体管 |