基本信息:
- 专利标题： Vacuum treatment system
- 专利标题（中）：真空处理系统
- 申请号：US11272216 申请日：2005-11-10
- 公开(公告)号：US20060102077A1 公开(公告)日：2006-05-18
- 发明人： Markus Esselbach , Martin Zaech , Orlaw Massler , Martin Grischke
- 申请人： Markus Esselbach , Martin Zaech , Orlaw Massler , Martin Grischke
- 申请人地址： LI Balzers
- 专利权人： Unaxis Balzers AG
- 当前专利权人： Unaxis Balzers AG
- 当前专利权人地址： LI Balzers
- 优先权： CH01866/04 20041112
- 主分类号： C23C14/00
- IPC分类号： C23C14/00 ; B01J19/08 ; C23C16/00
摘要：
A vacuum treatment system (1) for treating workpieces has a treatment chamber (10) that can be evacuated and in which a low-volt arc-discharge device is placed, with at least one locking loading/unloading aperture and at least one coating source placed on one side wall of the treatment chamber. It also has a device for producing a magnetic field to create a remote magnetic field and at least one workpiece holder to hold workpieces. A target-shutter arrangement (8, 8′) is designed so that when uncovered, the distance between the shutter (8) and the target (12) is less than 35 mm, thus allowing ignition and operation of a magnetron or cathode spark discharge behind the target, but preventing ignition of auxiliary plasma when the target (8) is turned off.
摘要（中）：
一种用于处理工件的真空处理系统（1）具有可以抽真空的处理室（10），其中放置有低压灭弧装置，具有至少一个锁定装载/卸载孔和至少一个涂覆源 放置在处理室的一个侧壁上。 它还具有用于产生磁场以产生远程磁场的装置和用于保持工件的至少一个工件保持器。 目标快门装置（8,8'）被设计成当未被覆盖时，快门（8）和目标（12）之间的距离小于35mm，从而允许点火和操作磁控管或阴极火花放电 在目标之后，但是当目标（8）关闭时，防止辅助等离子体的点燃。
公开/授权文献:
- US07905991B2 Vacuum treatment system 公开/授权日：2011-03-15