![Method for making a microelectronic interposer](/abs-image/US/2006/02/23/US20060040522A1/abs.jpg.150x150.jpg)
基本信息:
- 专利标题: Method for making a microelectronic interposer
- 专利标题(中):制造微电子插入器的方法
- 申请号:US11211810 申请日:2005-08-25
- 公开(公告)号:US20060040522A1 公开(公告)日:2006-02-23
- 发明人: Thomas Distefano , Joseph Fjelstad
- 申请人: Thomas Distefano , Joseph Fjelstad
- 申请人地址: US CA San Jose
- 专利权人: Tessera, Inc.
- 当前专利权人: Tessera, Inc.
- 当前专利权人地址: US CA San Jose
- 主分类号: H05K1/00
- IPC分类号: H05K1/00
摘要:
A microelectronic interposer is made by providing a sacrificial layer over the surface of a planar body. Apertures are formed passing through the body and the sacrificial layer. A layer of an electrically conductive structural material is deposited in each of the apertures and over the sacrificial layer, proximate to each aperture to thereby form contacts. The sacrificial layer is removed leaving the contacts with outwardly flaring peripheral portions spaced vertically above the surface of the planar body.
摘要(中):
通过在平面体的表面上设置牺牲层来制造微电子插入器。 形成穿过身体和牺牲层的孔。 一层导电结构材料沉积在每个孔中并在牺牲层上方,靠近每个孔,从而形成接触。 去除牺牲层,留下接触件,其外部扩张的外围部分在平面体的表面上方垂直地间隔开。
IPC结构图谱:
H | 电学 |
--H05 | 其他类目不包含的电技术 |
----H05K | 印刷电路;电设备的外壳或结构零部件;电气元件组件的制造 |
------H05K1/00 | 印刷电路 |