发明申请
US20050014073A1 Exposure mask device and method for orienting a plurality of substrates on an exposure mask
有权
基本信息:
- 专利标题： Exposure mask device and method for orienting a plurality of substrates on an exposure mask
- 专利标题（中）：曝光掩模装置和用于在曝光掩模上定向多个基板的方法
- 申请号：US10489528 申请日：2002-08-28
- 公开(公告)号：US20050014073A1 公开(公告)日：2005-01-20
- 发明人： Volker Wingsch , Joachim Gluck
- 申请人： Volker Wingsch , Joachim Gluck
- 优先权： DE101448767 20010912
- 国际申请： PCT/DE02/03143 WO 20020828
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F9/00
摘要：
A method for registering a plurality of substrates that are retained on a workpiece carrier onto an exposure mask for carrying out a photolithography process has the steps of registering and immobilizing the exposure mask onto an alignment panel having precisely fitting passthrough orifices for reception of one substrate for each passthrough orifice and inserting into the passthrough orifices of the alignment panel the substrates that are retained on the workpiece carrier.
摘要（中）：
用于将保留在工件载体上的多个基板登记到用于进行光刻工艺的曝光掩模上的方法具有将曝光掩模对准并将其固定在具有精确配合的通孔的对准面板上，用于接收一个基板 每个通孔孔口并将对准面板的通孔中的基板保持在工件载体上。