基本信息:
- 专利标题： 接觸孔圖案的形成方法及組成物
- 专利标题（英）：Method for forming contact hole pattern and composition
- 专利标题（中）：接触孔图案的形成方法及组成物
- 申请号：TW106103865 申请日：2017-02-07
- 公开(公告)号：TW201800837A 公开(公告)日：2018-01-01
- 发明人： 小松裕之 , KOMATSU, HIROYUKI , 小田智博 , ODA, TOMOHIRO , 堀雅史 , HORI, MASAFUMI , 成岡岳彦 , NARUOKA, TAKEHIKO , 永井智樹 , NAGAI, TOMOKI
- 申请人： JSR股份有限公司 , JSR CORPORATION
- 专利权人： JSR股份有限公司,JSR CORPORATION
- 当前专利权人： JSR股份有限公司,JSR CORPORATION
- 代理人： 葉璟宗; 鄭婷文; 詹富閔
- 优先权： 2016-022287 20160208
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; C09D153/00 ; C09D125/04 ; C09D133/12 ; C08J7/04 ; C08J7/00 ; H01L21/027 ; H01L21/308
The present invention is a method for forming a contact hole pattern, which comprises: a step for forming a hole pattern; a step for applying a first composition to the lateral surface of each hole so that the first composition is in the form of a ring along the lateral surface when viewed in plan; a step for forming a resin layer from a second composition inside the coated lateral surface of each hole; a step for causing phase separation of the resin layer; and a step for removing one or some phases in the phase-separated resin layer. The first composition contains a first polymer and a solvent; the second composition contains a solvent and a second polymer which contains a first block having a first structural unit and a second block having a second structural unit that has a higher polarity than the first structural unit; and the lateral surface of each hole immediately before the resin layer formation step has a static contact angle A (DEG) with water satisfying formula (1).