基本信息:
- 专利标题： 空白遮罩用基板、空白遮罩及其等之製造方法、轉印用遮罩之製造方法以及半導體元件之製造方法
- 专利标题（英）：Substrate for mask blank, mask blank, methods for manufacturing substrate for mask blank and mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device
- 专利标题（中）：空白遮罩用基板、空白遮罩及其等之制造方法、转印用遮罩之制造方法以及半导体组件之制造方法
- 申请号：TW104135976 申请日：2015-11-02
- 公开(公告)号：TW201631379A 公开(公告)日：2016-09-01
- 发明人： 池邊洋平 , IKEBE, YOHEI , 田邊勝 , TANABE, MASARU
- 申请人： HOYA股份有限公司 , HOYA CORPORATION
- 专利权人： HOYA股份有限公司,HOYA CORPORATION
- 当前专利权人： HOYA股份有限公司,HOYA CORPORATION
- 代理人： 林秋琴; 何愛文
- 优先权： 2014-257187 20141219
- 主分类号： G03F1/60
- IPC分类号： G03F1/60 ; G03F1/22 ; G03F1/24 ; H01L21/027
The purpose of the present invention is to provide a substrate for a mask blank, a mask blank, and a transfer mask, facilitating the correction of a wavefront using a wavefront correction function in an exposure device. The purpose of the present invention also includes providing methods for manufacturing these products. A virtual plane profile is assumed to optically form in effect, a flat reference plane profile defined by the Zernike polynomials constituted by only terms with 2nd order or less of the variables in relation to a radius and including one or more terms with 2nd order of the variables in relation to a radius. A substrate for a mask blank is selected to have data (a PV value) of 25 nm or less, which is representing a difference between the maximum value and the minimum value of the difference waveform between a composite plane profile acquired by synthesizing each plane profile of two principal surfaces and the virtual plane profile.
信息查询:
EspacenetIPC结构图谱:
| G | 物理 |
| --G03 | 摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术 |
| ----G03F | 图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备 |
| ------G03F1/00 | 用于图纹面的照相制版的原版的制备 |
| --------G03F1/60 | .基板 |