基本信息:
- 专利标题: 用於倍縮光罩最佳化之方法與裝置
- 专利标题(英):Method and apparatus for reticle optimization
- 专利标题(中):用于倍缩光罩最优化之方法与设备
- 申请号:TW105102946 申请日:2016-01-29
- 公开(公告)号:TW201629617A 公开(公告)日:2016-08-16
- 发明人: 泰爾 溫 提波 , TEL, WIM TJIBBO , 喬錢森 馬利那 , JOCHEMSEN, MARINUS , 史達爾 法蘭克 , STAALS, FRANK , 普麗緹絲 克里斯多弗 , PRENTICE, CHRISTOPHER , 迪皮兒 羅倫特 麥可 馬歇爾 , DEPRE, LAURENT MICHEL MARCEL , 貝特曼 喬哈奈 馬可斯 瑪麗亞 , BELTMAN, JOHANNES MARCUS MARIA , 渥克曼 羅伊 , WERKMAN, ROY , 威爾登伯格 裘簡 賽巴斯汀 , WILDENBERG, JOCHEM SEBASTIAAN , 摩斯 艾佛哈德斯 柯奈利斯 , MOS, EVERHARDUS CORNELIS
- 申请人: ASML荷蘭公司 , ASML NETHERLANDS B. V.
- 专利权人: ASML荷蘭公司,ASML NETHERLANDS B. V.
- 当前专利权人: ASML荷蘭公司,ASML NETHERLANDS B. V.
- 代理人: 林嘉興
- 优先权: 62/115,547 20150212;62/238,567 20151007
- 主分类号: G03F1/36
- IPC分类号: G03F1/36
A method includes determining topographic information of a substrate for use in a lithographic imaging system, determining or estimating, based on the topographic information, imaging error information for a plurality of points in an image field of the lithographic imaging system, adapting a design for a patterning device based on the imaging error information. In an embodiment, a plurality of locations for metrology targets is optimized based on imaging error information for a plurality of points in an image field of a lithographic imaging system, wherein the optimizing involves minimizing a cost function that describes the imaging error information. In an embodiment, locations are weighted based on differences in imaging requirements across the image field.
公开/授权文献:
- TWI616716B 用於調適圖案化器件之設計的方法 公开/授权日:2018-03-01