基本信息:
- 专利标题: 物件定位系統、控制系統、微影設備、物件定位方法及裝置製造方法
- 专利标题(英):Object positioning system, control system, lithographic apparatus, object positioning method and device manufacturing method
- 专利标题(中):对象定位系统、控制系统、微影设备、对象定位方法及设备制造方法
- 申请号:TW104116328 申请日:2015-05-21
- 公开(公告)号:TW201608346A 公开(公告)日:2016-03-01
- 发明人: 巴特勒 漢司 , BUTLER, HANS , 安真南 威赫目斯 漢瑞克斯 賽多魯司 馬力雅 , AANGENENT, WILHELMUS HENRICUS THEODORUS M , 德克斯 尼克 賈斯伯 , DIRKX, NIC JASPER , 卡米迪 雷米丁 伊薩爾 , KAMIDI, RAMIDIN IZAIR , 西蒙斯 威爾海莫斯 法蘭西斯可思 喬翰尼斯 , SIMONS, WILHELMUS FRANCISCUS JOHANNES
- 申请人: ASML荷蘭公司 , ASML NETHERLANDS B. V.
- 专利权人: ASML荷蘭公司,ASML NETHERLANDS B. V.
- 当前专利权人: ASML荷蘭公司,ASML NETHERLANDS B. V.
- 代理人: 林嘉興
- 优先权: 14171005.3 20140603
- 主分类号: G03F7/20
- IPC分类号: G03F7/20
The invention relates to an object positioning system comprising a movable object, an actuator system and a control system. The moveable object is moveable relative to a reference. The actuator system is configured to apply a force to the object at a force application location on the object in order to move the moveable object relative to the reference. The control system is configured to position a point of interest of the object relative to the reference. The control system is configured to drive the actuator system based on a parameter representing a spatial relationship between the force application location and the point of interest. The parameter is dependent on a further parameter representing a position of the object relative to the reference.