基本信息:
- 专利标题： 成膜裝置
- 专利标题（英）：Film forming apparatus
- 专利标题（中）：成膜设备
- 申请号：TW104115342 申请日：2015-05-14
- 公开(公告)号：TW201606118A 公开(公告)日：2016-02-16
- 发明人： 羽根秀臣 , HANE, HIDEOMI , 梅原隆人 , UMEHARA, TAKAHITO , 笠間健宏 , KASAMA, TAKEHIRO , 渡部翼 , WATANABE, TSUBASA
- 申请人： 東京威力科創股份有限公司 , TOKYO ELECTRON LIMITED
- 专利权人： 東京威力科創股份有限公司,TOKYO ELECTRON LIMITED
- 当前专利权人： 東京威力科創股份有限公司,TOKYO ELECTRON LIMITED
- 代理人： 林秋琴; 陳彥希; 何愛文
- 优先权： 2014-102782 20140516
- 主分类号： C23C16/455
- IPC分类号： C23C16/455 ; C23C16/458 ; H01J37/32
There is provided a film forming apparatus including a raw material gas nozzle provided with gas discharge holes for discharging a mixed gas of a raw material gas and a carrier gas; a flow regulating plate portion extended along the longitudinal direction of the raw material gas nozzle; a central region configured to supply a separating gas from a center side within a vacuum container toward a substrate loading surface of a rotary table; a protuberance portion protruded from the flow regulating plate portion toward the rotary table at a position shifted toward a center side of the rotary table from the gas discharge holes; and a protuberance portion configured to restrain the separating gas from flowing between the flow regulating plate portion and the rotary table; and an exhaust port configured to vacuum exhaust the interior of the vacuum container.