基本信息:
- 专利标题: 用於組合式明場、暗場及光熱檢測之裝置及方法
- 专利标题(英):Apparatus and methods for combined brightfield, darkfield, and photothermal inspection
- 专利标题(中):用于组合式明场、暗场及光热检测之设备及方法
- 申请号:TW104104820 申请日:2015-02-12
- 公开(公告)号:TW201534902A 公开(公告)日:2015-09-16
- 发明人: 妮可雷德思 蕾娜 , NICOLAIDES, LENA , 馬哈迪文 摩漢 , MAHADEVAN, MOHAN , 索尼克 艾力克斯 , SALNIK, ALEX , 楊 史考特A , YOUNG, SCOTT A
- 申请人: 克萊譚克公司 , KLA-TENCOR CORPORATION
- 专利权人: 克萊譚克公司,KLA-TENCOR CORPORATION
- 当前专利权人: 克萊譚克公司,KLA-TENCOR CORPORATION
- 代理人: 陳長文
- 优先权: 61/939,135 20140212;14/618,586 20150210
- 主分类号: G01N21/95
- IPC分类号: G01N21/95
Disclosed are methods and apparatus for detecting defects or reviewing defects in a semiconductor sample. The system has a brightfield (BF) module for directing a BF illumination beam onto a sample and detecting an output beam reflected from the sample in response to the BF illumination beam. The system has a modulated optical reflectance (MOR) module for directing a pump and probe beam to the sample and detecting a MOR output beam from the probe spot in response to the pump beam and the probe beam. The system includes a processor for analyzing the BF output beam from a plurality of BF spots to detect defects on a surface or near the surface of the sample and analyzing the MOR output beam from a plurality of probe spots to detect defects that are below the surface of the sample.
信息查询:
EspacenetIPC结构图谱:
G | 物理 |
--G01 | 测量;测试 |
----G01N | 借助于测定材料的化学或物理性质来测试或分析材料 |
------G01N21/00 | 利用光学手段,即利用红外光、可见光或紫外光来测试或分析材料 |
--------G01N21/01 | .便于进行光学测试的装置或仪器 |
----------G01N21/88 | ..测试瑕疵、缺陷或污点的存在 |
------------G01N21/95 | ...特征在于待测物品的材料或形状 |