发明专利
TW201223702A 匹配測量光譜與參照光譜以進行原位光學監測的技術 TECHNIQUES FOR MATCHING MEASURED SPECTRA TO REFERENCE SPECTRA FOR IN-SITU OPTICAL MONITORING
审中-公开
基本信息:
- 专利标题： 匹配測量光譜與參照光譜以進行原位光學監測的技術 TECHNIQUES FOR MATCHING MEASURED SPECTRA TO REFERENCE SPECTRA FOR IN-SITU OPTICAL MONITORING
- 专利标题（英）：Techniques for matching measured spectra to reference spectra for in-situ optical monitoring
- 专利标题（中）：匹配测量光谱与参照光谱以进行原位光学监测的技术 TECHNIQUES FOR MATCHING MEASURED SPECTRA TO REFERENCE SPECTRA FOR IN-SITU OPTICAL MONITORING
- 申请号：TW100127257 申请日：2011-08-01
- 公开(公告)号：TW201223702A 公开(公告)日：2012-06-16
- 发明人： 胡曉源 , 王志宏 , 李哈利Q , 朱志澤 , 大衛傑弗瑞杜魯 , 班維紐多明尼克J , 章及明 , 涂文強
- 申请人： 應用材料股份有限公司
- 申请人地址： APPLIED MATERIALS, INC. 美國 US
- 专利权人： 應用材料股份有限公司
- 当前专利权人： 應用材料股份有限公司
- 当前专利权人地址： APPLIED MATERIALS, INC. 美國 US
- 代理人： 蔡坤財; 李世章
- 优先权： 美國 61/371,405 20100806
- 主分类号： B24B
- IPC分类号： B24B
A method of controlling polishing includes storing a library having a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra. Finding a best matching reference spectrum may include performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum.