基本信息:
- 专利标题： 複合氧化物燒結體、非晶質複合氧化膜之製造方法、非晶質複合氧化膜、結晶質複合氧化膜之製造方法及結晶質複合氧化膜
- 专利标题（英）：Composite oxide sinter, process for producing amorphous composite oxide film, amorphous composite oxide film, process for producing crystalline composite oxide film, and crystalline composite oxide film
- 专利标题（中）：复合氧化物烧结体、非晶质复合氧化膜之制造方法、非晶质复合氧化膜、结晶质复合氧化膜之制造方法及结晶质复合氧化膜
- 申请号：TW097126039 申请日：2008-07-10
- 公开(公告)号：TW200906729A 公开(公告)日：2009-02-16
- 发明人： 生澤正克 IKISAWA, MASAKATSU , 矢作政隆 YAHAGI, MASATAKA , 長田幸三 OSADA, KOZO , 掛野崇 KAKENO, TAKASHI
- 申请人： 日金屬股份有限公司 NIPPON MINING & METALS CO., LTD.
- 申请人地址： 日本
- 专利权人： 日金屬股份有限公司 NIPPON MINING & METALS CO., LTD.
- 当前专利权人： 日金屬股份有限公司 NIPPON MINING & METALS CO., LTD.
- 当前专利权人地址： 日本
- 代理人： 桂齊恆; 閻啓泰
- 优先权： 日本 JP2007-183799 20070713
- 主分类号： C01G
- IPC分类号： C01G ; C23C
An amorphous film which consists substantially of indium, tin, calcium, and oxygen, and has a tin content and a calcium content of 5-15% in terms of Sn/(In+Sn+Ca) atom number ratio and 0.1-2.0% in terms of Ca/(In+Sn+Ca) atom number ratio, respectively, with the remainder being indium and oxygen. It is characterized in that the film, upon annealing at 260 DEG C or lower, crystallizes and comes to have a resistivity of 0.4 mO or lower. The ITO film is a thin ITO film for use in, e.g., a display electrode for flat panel displays. The amorphous ITO film is obtained by film deposition on a substrate by sputtering without heating the substrate and without water addition during the deposition. This ITO film has the property of crystallizing upon annealing at 260 DEG C or lower, which is not so high, and thereby coming to have a lower resistivity than before the crystallization.; Also provided are a process for producing the ITO film and a sinter for the film production.
公开/授权文献:
- TWI476159B 複合氧化物燒結體、非晶質複合氧化膜之製造方法、非晶質複合氧化膜、結晶質複合氧化膜之製造方法及結晶質複合氧化膜 公开/授权日：2015-03-11