基本信息:
- 专利标题: 貼合方法及貼合裝置
- 专利标题(英):Bonding method and bonding apparatus
- 专利标题(中):贴合方法及贴合设备
- 申请号:TW096136379 申请日:2007-09-28
- 公开(公告)号:TW200832397A 公开(公告)日:2008-08-01
- 发明人: 成田悠 NARITA, HARUKA
- 申请人: 芝浦機械電子裝置股份有限公司 SHIBAURA MECHATRONICS CORPORATION
- 申请人地址: 日本
- 专利权人: 芝浦機械電子裝置股份有限公司 SHIBAURA MECHATRONICS CORPORATION
- 当前专利权人: 芝浦機械電子裝置股份有限公司 SHIBAURA MECHATRONICS CORPORATION
- 当前专利权人地址: 日本
- 代理人: 林志剛
- 优先权: 日本 2006-263951 20060928
- 主分类号: G11B
- IPC分类号: G11B
Provided are a bonding method and a bonding apparatus, by which bubbles in an adhesive layer can be reduced while ensuring uniformity of the adhesive layer at the time of application and suppressing fluctuation of the adhesive layer during manufacture. The bonding apparatus is provided with a first spin-coating apparatus (1) for coating one surface of a first substrate (P1) with an adhesive (B1); a second spin-coating apparatus for coating one surface of a second substrate (P2) with an adhesive (B2) thinner than the adhesive (B1) on the first substrate; a pre-irradiation section (4) for temporarily hardening the adhesive (B1) on the first substrate (P1); a bonding section (5) for bonding the surface of the first substrate (P1) whereupon the adhesive (B1) is applied, with the surface of the second substrate (P2) whereupon the adhesive (B2) is applied; and a post-irradiation section (6) for hardening the adhesives (B1, B2) between the first substrate (P1) and the second substrate (P2).