基本信息:
- 专利标题: 基板洗淨方法及基板洗淨裝置
- 专利标题(英):Substrate cleaning method and substrate cleaning apparatus
- 专利标题(中):基板洗净方法及基板洗净设备
- 申请号:TW096109476 申请日:2007-03-20
- 公开(公告)号:TW200802575A 公开(公告)日:2008-01-01
- 发明人: 松村榮治 , 萩原信子
- 申请人: 松村榮治 , 萩原信子
- 申请人地址: 日本 日本
- 专利权人: 松村榮治,萩原信子
- 当前专利权人: 松村榮治,萩原信子
- 当前专利权人地址: 日本 日本
- 代理人: 賴經臣; 宿希成
- 优先权: 日本 2006-77184 20060320 日本 2006-316253 20061122
- 主分类号: H01L
- IPC分类号: H01L
摘要:
本發明提供一種不會對基板產生不良影響之基板洗淨方法。使用藉由氣液混合法而無添加生成之臭氧水來洗淨基板之基板洗淨方法,基特徵在於,該臭氧水所含有之臭氧氣泡之粒徑R為0
摘要(中):
本发明提供一种不会对基板产生不良影响之基板洗净方法。使用借由气液混合法而无添加生成之臭氧水来洗净基板之基板洗净方法,基特征在于,该臭氧水所含有之臭氧气泡之粒径R为0
摘要(英):
To provide a substrate cleaning method wherein substrate is not adversely affected. A substrate cleaning method is provided for cleaning a substrate by using ozone water produced by a gas-liquid mixing method without using additives. The method is characterized in that the diameter R of ozone bubbles contained in the ozone water is 0 < R ≤ 50nm. Since the diameter of the ozone bubble is within such range, buoyancy is not easily given from the ozone water. As a result, the ozone bubbles are prevented from moving up, and the ozone water is not easily degassed. Thus, sufficient cleaning effects are obtained by having the ozone water not easily degassed.