基本信息:
- 专利标题： 研磨墊之製造方法(一)
- 专利标题（英）：Method for manufacturing polishing pad
- 专利标题（中）：研磨垫之制造方法(一)
- 申请号：TW096113791 申请日：2007-04-19
- 公开(公告)号：TW200800489A 公开(公告)日：2008-01-01
- 发明人： 福田武司 FUKUDA, TAKESHI , 渡邊二夫 WATANABE, TSUGUO , 廣瀨純司 HIROSE, JUNJI , 中村賢治 NAKAMURA, KENJI , 堂浦真人 DOURA, MASATO
- 申请人： 東洋橡膠工業股份有限公司 TOYO TIRE & RUBBER CO., LTD.
- 申请人地址： 日本
- 专利权人： 東洋橡膠工業股份有限公司 TOYO TIRE & RUBBER CO., LTD.
- 当前专利权人： 東洋橡膠工業股份有限公司 TOYO TIRE & RUBBER CO., LTD.
- 当前专利权人地址： 日本
- 代理人： 惲軼群; 陳文郎
- 优先权： 日本 2006-115890 20060419 日本 2006-115897 20060419 日本 2006-115904 20060419 日本 2006-115907 20060419 日本 2007-088388 20070329
- 主分类号： B24B
- IPC分类号： B24B ; C08G ; H01L
Provided is a method for manufacturing a polishing pad with a reduced number of manufacturing steps and excellent productivity. A method for manufacturing a laminated polishing pad with a reduced number of manufacturing steps and excellent productivity without peeling between a polishing layer and a cushion layer is also provided. The method for manufacturing the polishing pad includes a step of preparing a bubble dispersed urethane composition by machine foaming method; a step of continuously discharging the bubble dispersed urethane composition on a face material, while feeding the face material; a step of laminating another face material on the bubble dispersed urethane composition; a step of forming a polishing layer composed of a polyurethane foam by hardening the bubble dispersed urethane composition, while adjusting the thickness uniform; a step of manufacturing two long polishing layers composed of the polishing layer and the face material at the same time by cutting the polishing layer into two in parallel to the face; and a step of cutting the long polishing layers.
公开/授权文献:
- TWI374791B 研磨墊之製造方法（一） 公开/授权日：2012-10-21