基本信息:
- 专利标题: 具載體箔之電解銅箔及其製造方法
- 专利标题(英):Electrolytic copper foil with carrier foil and process for producing the same
- 专利标题(中):具载体箔之电解铜箔及其制造方法
- 申请号:TW094131083 申请日:2005-09-09
- 公开(公告)号:TW200615403A 公开(公告)日:2006-05-16
- 发明人: 松永哲廣 , 松島敏文 MATSUSHIMA, TOSHIFUMI , 佐藤哲朗 SATO, TETSURO , 中村健介 , 今裕之 , 岩切健一郎 IWAKIRI, KEN-ICHIRO
- 申请人: 三井金屬業股份有限公司 MITSUI MINING & SMELTING CO., LTD.
- 申请人地址: 日本
- 专利权人: 三井金屬業股份有限公司 MITSUI MINING & SMELTING CO., LTD.
- 当前专利权人: 三井金屬業股份有限公司 MITSUI MINING & SMELTING CO., LTD.
- 当前专利权人地址: 日本
- 代理人: 洪澄文
- 优先权: 日本 2004-264640 20040910
- 主分类号: C25D
- IPC分类号: C25D
As provided by the present invention is an electrolytic copper foil with a carrier foil furnished with a primer resin layer, that even when the electrolytic copper foil with a carrier foil at its surface to be bonded with a substrate resin layer has low surface roughness, exhibits high adherence, and that when pinholes, etc. remain in the bulk copper layer, or when the inside wall part of through-holes, via holes, etc. is brought into contact with a desmear solution, allows any detachment due to erosion between electrolytic copper foil layer and substrate resin layer to be less probable. Thus, there is provided an electrolytic copper foil with a carrier foil furnished with a primer resin layer, comprising a carrier foil and, sequentially superimposed on at least one major surface thereof, a junction interface layer, a bulk copper layer, a Ni-Zn containing plating layer and a primer resin layer, wherein the Ni-Zn containing plating layer contains Ni and Zn in a Ni/Zn adhesion ratio of 1.5 to 10. Further, there is provided a process for producing the same.
公开/授权文献:
- TWI272320B 具載體箔之電解銅箔及其製造方法 公开/授权日:2007-02-01
信息查询:
EspacenetIPC结构图谱:
C | 化学;冶金 |
--C25 | 电解或电泳工艺;其所用设备 |
----C25D | 覆层的电解或电泳生产工艺方法;电铸;工件的电解法接合;所用的装置 |