发明专利
TW200302282A 掃描探針顯微尖端之核酸直接寫入奈米微影沉積 DIRECT WRITE NANOLITHOGRAPHIC DEPOSITION OF NUCLEIC ACIDS FROM SCANNING PROBE MICROSCOPIC TIPS
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基本信息:
- 专利标题： 掃描探針顯微尖端之核酸直接寫入奈米微影沉積 DIRECT WRITE NANOLITHOGRAPHIC DEPOSITION OF NUCLEIC ACIDS FROM SCANNING PROBE MICROSCOPIC TIPS
- 专利标题（英）：Direct write nanolithographic deposition of nucleic acids from scanning probe microscopic tips
- 专利标题（中）：扫描探针显微尖端之核酸直接写入奈米微影沉积 DIRECT WRITE NANOLITHOGRAPHIC DEPOSITION OF NUCLEIC ACIDS FROM SCANNING PROBE MICROSCOPIC TIPS
- 申请号：TW091134938 申请日：2002-12-02
- 公开(公告)号：TW200302282A 公开(公告)日：2003-08-01
- 发明人： 薛德A 米爾金 CHAD A. MIRKIN , 利奈特M 迪摩斯 LINETTE M. DEMERS , 大衛S 金傑 DAVID S. GINGER
- 申请人： 美國西北大學 NORTHWESTERN UNIVERSITY
- 申请人地址： 美國
- 专利权人： 美國西北大學 NORTHWESTERN UNIVERSITY
- 当前专利权人： 美國西北大學 NORTHWESTERN UNIVERSITY
- 当前专利权人地址： 美國
- 代理人： 陳長文
- 优先权： 美國 60/337,598 20011130 美國 60/362,924 20020307
- 主分类号： C12Q
- IPC分类号： C12Q
The use of direct-write nanolithography to generate anchored, nanoscale patterns of nucleic acid on different substrates is described, including electrically conductive and insulating substrates. Modification of nucleic acid, including oligonucleotides, with reactive groups such as thiol groups provides for patterning with use of appropriate scanning probe microscopic tips under appropriate conditions. The reactive groups provide for chemisorption or covalent bonding to the substrate surface. The resulting nucleic acid features, which exhibit good stability, can be hybridized with complementary nucleic acids and probed accordingly with use of, for example, nanoparticles functionalized with nucleic acids. Patterning can be controlled by selection of tip treatment, relative humidity, and nucleic acid structure.