基本信息:
- 专利标题: 극자외선 광원 장치 및 극자외선 광 발생 방법
- 专利标题(英):EXTREME ULTRAVIOLET LIGHT SOURCE AND METHOD OF GENERATING EUV LIGHT
- 申请号:KR1020140160099 申请日:2014-11-17
- 公开(公告)号:KR102336300B1 公开(公告)日:2021-12-07
- 主分类号: H05G2/00
- IPC分类号: H05G2/00 ; G03F1/22 ; G01J1/42
An extreme ultraviolet (EUV) light source device includes a source droplet generator for generating source droplets as a target source for generating extreme ultraviolet (EUV) light and for injecting the source droplets to a collector, a light irradiator for directing a detection light to an injection path of the source droplets, a light detector for detecting the detection light blocked by the source droplet, and a source droplet controller electrically connected to the light detector and the source droplet generator for analyzing the detection light to determine whether a satellite of the source droplet is generated or to determine a size of the generated satellite and for controlling a formation of a stream of source droplets based on the determination result.
公开/授权文献:
- KR1020160058511A 극자외선 광원 장치 및 극자외선 광 발생 방법 公开/授权日:2016-05-25
信息查询:
EspacenetIPC结构图谱:
H | 电学 |
--H05 | 其他类目不包含的电技术 |
----H05G | X射线技术 |
------H05G2/00 | 没有X射线管的、专用于产生X射线的设备或方法,如有等离子产生 |