基本信息:
- 专利标题： 마스크 블랭크용 기판의 제조방법, 마스크 블랭크의 제조방법 및 전사용 마스크의 제조방법
- 专利标题（英）：KR102228638B1 - Method for manufacturing mask blank substrate, method for manufacturing mask blank and method for manufacturing transfer mask
- 申请号：KR1020157016456 申请日：2014-01-08
- 公开(公告)号：KR102228638B1 公开(公告)日：2021-03-16
- 发明人： 야마다다케유키 , 니시무라다카히토
- 申请人： 호야 가부시키가이샤
- 申请人地址： *-**-*, Nishi-Shinjuku, Shinjuku-ku, Tokyo, Japan
- 专利权人： 호야 가부시키가이샤
- 当前专利权人： 호야 가부시키가이샤
- 当前专利权人地址： *-**-*, Nishi-Shinjuku, Shinjuku-ku, Tokyo, Japan
- 代理人： 특허법인(유한) 다래
- 优先权： JPJP-P-2013-007074 2013-01-18
- 国际申请： PCT/JP2014/050110 2014-01-08
- 国际公布： WO2014112409 2014-07-24
- 主分类号： G03F1/50
- IPC分类号： G03F1/50 ; G03F1/82 ; B01J23/42 ; H01L21/027 ; H01L21/033
The present invention is a low-defect and high-quality method of manufacturing a mask blank substrate, which can suppress the occurrence of a phenomenon in which a part of a transfer pattern and the main surface of the substrate underneath it fall integrally, and the mechanical strength of the main surface of the mask blank substrate. A method of manufacturing a low-defect and high-quality mask blank capable of suppressing deterioration and suppressing the occurrence of a phenomenon in which a part of the transfer pattern and the main surface of the substrate beneath it are integrally dropped, and a part of the transfer pattern and the underneath It provides a method of manufacturing a low-defect and high-quality transfer mask with less pattern defects by suppressing the occurrence of a phenomenon in which the main surface of a substrate is integrally falling. The mask blank is prepared by preparing a mask blank substrate X in which the substrate main surface X1 is polished using a polishing liquid containing abrasive grains, and the main surface X1 is etched on the basis of a catalyst to obtain the main surface X1. After removing the modified portion of the substrate X, a thin film for forming a transfer pattern is formed on the main surface X1 of the substrate X by sputtering to form a film.
公开/授权文献:
- KR1020150108354A 마스크 블랭크용 기판의 제조방법, 마스크 블랭크의 제조방법 및 전사용 마스크의 제조방법 公开/授权日：2015-09-25